The Effect of Unbalanced Magnetron Spattering on Mechanical Properties and Strength of Titanium Nitrate and Tin Dioxide Thin Films

Behnaz Ali jani¹ Hossein Ghazavi²

1) 1. Department of Biomedical Engineering, Najafabad Branch, Islamic Azad University, Najafabad, Iran
2) Department of Mechanical Engineering, Najafabad Branch, Islamic Azad University, Najafabad, Iran

Publication : 2nd International Conference on New Research & Achievements in Science, Engineering & Technologies(setbconf.com/2nd)
Abstract :
Spattering is the process by which atoms or molecules of a substance are separated from a target by targeting high-energy particles. Sputtering is one of the processes that requires vacuum. In this process, first the chamber is emptied by rotary pumps and then by distribution pump or turbo molecular, respectively. The most common way to supply ions and produce plasma is through the continuous passage of an argon-like gas into the chamber, which causes the vacuum to be slightly broken. When electrons collide with argon gas atoms, they are decomposed into negatively charged electrons and positively charged ions, so that the primary electrons and secondary electrons produced by ionization re-participate in the ionization of other gas atoms. A plasma or glowing arc is formed. Plasma is generated by DC or RF power supply. If the voltage of the power supply is DC, it is called direct sputtering, in which the voltage applied to the poles is constant and does not change. This mode is used to coat the metals. We usually connect the cathode to the negative terminal of the power supply, to which about 5 kV is applied. In front of the cathode is a substrate or anode that connects to ground. The greater the potential difference between the cathode and the anode, the greater the energy of the electrons, which produce more electrons and ions on their way to the anode when they collide with other atoms. Eventually the electrons move towards the anode and the ions move towards the cathode and hit the target. Bombing is done by positive ions generated by the electrical discharge of a gas (such as argon). this paper deals with The Effect of Unbalanced Magnetron Spattering on Mechanical Properties and Strength of Titanium Nitrate and Tin Dioxide Thin Films.
Keywords : Magnetron Sputtering DC RF Mechanical Properties Titanium Nitrate Tin Dioxide Thin Films